Low-Temperature-Curable and Photo-Patternable Benzocyclobutene-Derived
Aggregation-Induced Emission (AIE)-Active Polymer Dielectrics
Abstract
The high curing temperatures required for traditional benzocyclobutene
(BCB) materials have posed limitations on their applicability in
high-temperature-sensitive fields. To address this challenge, our work
focuses on the synthesis of a novel tetraphenylethylene
(TPE)-functionalized BCB monomer, TPE-BCB, achieved through the
introduction of an ether bond onto the BCB’s four-membered ring via
Williamson reaction. TPE-BCB demonstrates remarkable low-temperature
curing properties, characterized by a ring-opening peak temperature of
190 °C, representing a 25% reduction compared to conventional BCBs.
Fully cured TPE-BCB resins exhibit exceptional dielectric and mechanical
properties, coupled with minimal water absorption. Additionally, the
incorporation of TPE with aggregation-induced emission (AIE)
characteristics enhances the resins’ luminescence and photolithographic
capabilities. Notably, our TPE-BCB resins achieve impressive
photolithography performance with a resolution ratio of up to 10 µm. In
contrast to conventional BCB-functionalized resins, TPE-BCB offers the
dual advantage of low-temperature curing and luminescence. This
development marks a significant step in the advancement of
low-temperature curing BCB materials and serves as a pioneering example
in the realm of multi-layer wafer bonding materials.