Electrical Analysis of an Enhanced Stepped Hybrid Buffer HEMT with
AlGaN/p-GaN/AlGaN Dual Heterojunctions
Abstract
High Electron Mobility Transistors (HEMTs) are widely recognized for
their exceptional performance in high-frequency applications, yet
improvements are still needed in areas of low power consumption and high
efficiency. To enhance overall performance, this paper proposes a novel
structure, integrating a thin AlGaN cap layer between the p-GaN and the
gate metal within a developed stepped hybrid buffer layer HEMT.
Observations of the electric field distribution in TCAD simulations
further confirmed the formation of a dual junction. The advantages of
this structure include an increased overall device performance,
featuring a threshold voltage of 2.3V, a gate current of only 4.810-7
A/mm, an output current of 0.25 A/mm, a BFOM value reaching 1.48 GW/cm2,
and a breakdown voltage is 1454V. These characteristics hold potential
for emerging applications such as 5G communications and electric vehicle
power control systems. The results of this study not only help deepen
the understanding of the impact of the AlGaN cap layer on HEMT
performance but also provide new ideas and directions for the design and
optimization of future.