In this study, we investigate the optical parameters of plasmonic Titanium Nitride (TiN) thin films using the RefFIT software, employing the Drude-Lorentz model for data fitting. TiN is an emerging material for plasmonic applications due to its high melting point, wear resistance, and stability at various temperatures, positioning it as a viable alternative to traditional noble metals. Our research focuses on fabricating, characterizing and extracting optical and electrical properties of TiN thin films deposited on silicon wafers using ellipsometry and Fourier Transform Infrared (FTIR) spectroscopy.We analyze six different samples, varying in thickness and composition, to determine key parameters such as plasma frequency and damping constants. The simultaneous fitting of reflectance and ellipsometry data in RefFIT provided results consistent with existing literature, establishing the software’s reliability for such analysis. Additionally, we validated the RefFIT results by comparing them with alternative models and experimental data, demonstrating the necessity of incorporating Lorentz terms alongside Drude components for accurate optical characterization.Our findings reveal that TiN films exhibit desirable plasmonic properties, with carrier concentration and relaxation times aligning with known trends in nitrides. The robustness of RefFIT in modeling these properties confirms its utility for future research in plasmonic materials. This study underscores the potential of TiN in advanced plasmonic devices and encourages further exploration using comprehensive modeling techniques.